Chapter 611 The research and development process of domestic lithography machines has been shortened by at least ten years!
Since Xingyuan Technology and the Institute of Optoelectronics under the Huazhong University of Science and Technology jointly developed the "magnetic confinement discharge plasma light source" (MDP) technology, they began to tackle the second largest technical barrier of lithography machines - the optical system.
After all, it is not enough to just "create light", but you also have to "use this light well" to complete wafer exposure and then realize chip production.
But what makes Chen Yansen feel helpless is that the mainstream research and development direction of domestic EUV light source excitation methods is basically based on laser-generated plasma, discharge plasma or laser-induced discharge plasma.
However, the skills and project experience of most engineers in Xingyuan Technology's optical department do not match the R&D needs.
Therefore, the progress in developing the supporting optical system was extremely slow.
You should know that EUV light will be absorbed by almost all substances, so traditional glass lenses cannot be used. The entire optical path must use a reflective optical system in a vacuum environment.
The collecting mirror, lighting system, projection objective system, mask plate and mask stage all need to be designed with matching technical solutions.
MDP-EUV light source technology has indeed blazed a unique new path, but this innovation does not come without cost.
You have to clear all obstacles by yourself.
After learning about the research and development progress of the optical department, Chen Yansen immediately despaired.
He knew in his heart that if he didn't show these people a clear path forward, they might not be able to take a single step forward in five or ten years.
It has to be said that he overestimated the level of Lin Nan's team.
He didn't expect that with such a simple supporting technical solution, Lin Nan and others had been on the edge of the right intersection for forty or fifty days without making any progress.
Therefore, after developing Mass V1.0, Chen Yansen immediately designed the "multi-shell grazing incidence elliptical collecting mirror system".
This thing is essentially a set of precision multi-layer mirrors that can efficiently capture EUV light source and initially focus it and guide it into the illumination system.
There are two main difficulties: collection efficiency and damage resistance.
The former is because EUV light diverges in all directions. If you want to improve the collection efficiency, you have to design a complex multi-mirror splicing structure and ensure that the angle calibration accuracy of each mirror reaches the micron level.
However, any deviation in angle will cause light to be lost, thus affecting the collection efficiency.
The latter is because when the plasma light source is excited, it will generate extremely high temperature, which requires super strong damage resistance.
Collection efficiency requires that the multilayer film be “thin, uniform, pure, and unobstructed” to maximize reflectivity and angle adaptability.
The damage resistance requires that the multilayer film must be "thick, hard and erosion-resistant", and an additional protective layer of material must be added.
It sounds contradictory, but this is precisely the technical difficulty of collecting mirrors.
The "multi-shell grazing-incidence elliptical collecting mirror system" designed by Chen Yansen has a good balance between collection efficiency and damage resistance.
It can not only efficiently capture the 13.5-nanometer EUV light generated by high-power pulse discharge bombarding the metal tin target, but also focus it to a distant intermediate focus, providing a sufficiently powerful and uniform beam for the subsequent lighting system.
at the same time.
Lin Nan quickly discovered the encrypted email. After opening the technical document, he glanced at it quickly and then froze in place.
The solution sent by the boss was so complete, from the optical design configuration and incident angle to the substrate material, reflective coating, thermal management subsystem and electromagnetic field debris mitigation system, and even the parameter table of the coating process and the algorithm model for error calibration were included.
The optical department had been arguing about the "multi-mirror splicing angle deviation" problem for half a month. The document directly provided a solution of "real-time calibration of laser interferometry", and even the laser wavelength and sampling frequency used for calibration were clearly marked.
Lin Nan stood up suddenly, his voice trembling: "This is simply writing the answer!"
There is no signature in the technical document. Did the boss buy or steal this technology? Or does Senlian Capital actually have another R&D laboratory in addition to the optical department of Xingyuan Technology?
Lin Nan sat at his workstation and couldn't help but think wildly.
Last time, he asked Liang Jinsong and Chen Yansen about the MDP-EUV light source technology.
Liang Jinsong was completely confused, and Chen Yansen told him not to ask any questions, so he could only suppress his curiosity in his heart.
But this time, he couldn't hold back anymore.
The technology of the "multi-shell grazing-incidence elliptical collecting mirror system" is really too powerful. It is a complete and mature technical solution, which makes him think more about it.
Lin Nan pondered for a while, finally gave a wry smile, and put down his right hand that was holding the phone.
He knew that if others didn't want to talk about some questions, it meant they couldn't talk about them, or there was no answer at all.
Afterwards, he quickly called a meeting of core R&D personnel.
In the conference room, when everyone saw the three-dimensional model of the "multi-shell elliptical structure" in the document, the originally dull atmosphere suddenly became lively.
The lead engineer in the optical system design team pointed to the screen and said, "The inner mirror is responsible for capturing EUV light within the central 60-degree range. The middle mirror covers 60 to 120 degrees, and the outer mirror completes the 120 to 180 degrees. This will increase the collection efficiency to at least 80%. There's no comparison. Our previous solution is garbage."
What surprised everyone even more was the thermal management subsystem!
The document proposes embedding a microchannel water-cooling structure inside the mirror body, combined with a high-temperature resistant molybdenum-rhenium alloy substrate, which can not only withstand the high-temperature impact of plasma, but also avoid the shedding of the multi-layer film due to excessive temperature.
"Our biggest concern was high-temperature damage, but this solution even factored in the diameter of the water cooling channel and the water flow rate!"
The engineer from the materials group turned to the process parameter page and spoke excitedly.
"By the way, Engineer Lin! This gradient coating solution, from the molybdenum-silicon multilayer film to the silicon dioxide protective layer, requires a thickness tolerance of less than 0.1 nanometer for each layer. It also requires 80 deposition passes using pulsed laser deposition. Can our equipment achieve this level of precision?"
Someone said worriedly with a troubled look on his face.
Lin Nan frowned and looked at the lead engineer in the equipment group and asked, "Can the Zeiss coating machine maintain a stable accuracy between 0.05 and 0.1 nanometers in a constant temperature and humidity environment?"
The chief engineer of the equipment group thought for a moment and replied very seriously: "Continuously depositing 10 layers of molybdenum-silicon film, the thickness error is as small as 0.04 nanometers and as large as 0.09 nanometers, which just meets the requirements of the plan.
But the problem is that every time the target material is changed or the laser power is adjusted, the error will fluctuate by 0.12 to 0.15 nanometers. After 80 depositions, the cumulative error may exceed the standard."
Lin Nan thought for a moment and offered a solution: "Then add a real-time calibration process. The algorithm team will first develop a film thickness monitoring program that will be linked to the coating machine's sensors. After every 10 layers are deposited, it will automatically pause and scan the film thickness with an electron microscope.
Adjust the laser power and deposition time for the next round based on the measured data to control the single error within 0.05 nanometers.
In addition, a constant temperature cover is added around the coating machine to avoid the negative impact of temperature."
When the others heard this, they suddenly understood.
After all, Lin Nan is a senior engineer at the Shanghai Institute of Optical Precision Mechanics. He has both ability and technology, and he is also a talent highly recommended by Hu Ruihui. It is normal for him to come up with effective solutions at critical moments.
In fact, in Chen Yansen's opinion, people like Lin Nan have good IQ, comprehension and creativity, but they have no access to the cutting-edge technology of EUV optics, which makes them like a ghost with a wall around them, always taking detours.
If he had the same scientific research environment, Lin Nan might be able to develop a collection mirror system, but there are no ifs in many things.
Chen Yansen was able to master this technology because of his mental strength which was a hundred times greater than that of an ordinary person, as well as his talent of [Planck Clock] which allowed him to enter an overclocked thinking state.
Otherwise, with his original ability, he might be able to break through this technology, but it would definitely take more than half a month.
After receiving the technical solution of the "multi-shell grazing-incidence elliptical collecting mirror system", the optical department of Xingyuan Technology immediately devoted all its energy to repeatedly polish and reproduce it at the fastest speed, striving to successfully apply this system to actual production.
The algorithm team worked overtime overnight and completed the development of the film thickness monitoring program within three days.
The program can collect the laser power and deposition time data of the coating machine in real time, and can also automatically generate a film thickness error curve. When the error exceeds 0.05 nanometers, a pause command will be triggered, and the accuracy will be calibrated in real time.
Since there were a large number of engineers from the Institute of Optoelectronics in the R&D center, the leaders of the science association soon learned about Xingyuan Technology's technological breakthrough.
"Old Hu, can you help me ask if Xingyuan Technology is still short of people?"
Wang Xiangchao from the Shanghai Institute of Optical Precision Mechanics took the initiative to call Hu Ruihui and spoke hesitantly.
"What do you mean? You want to quit? You must be kidding!"
Hu Ruihui asked back.
Wang Xiangchao is the backbone of the Shanghai Institute of Optics and Precision Mechanics. His main research direction is in the field of EUV light source. He has applied for more than 170 patents and is a true industry leader.
"Old Hu, Xingyuan Technology has even developed its own collection mirror system. Do you know what this means? Moving forward, the light source system will be completely developed. Once the development of the dual worktable is completed, the technical foundation for the first domestically produced EUV lithography machine will be laid. Do you understand?"
Wang Xiangchao held the phone and asked questions one after another.
"Old Wang, you're already old..."
Hu Ruihui said quietly.
"Bullshit! Sixty years old is the age to strive for success! Forget it, I'd better go find Lin Nan. After all, I'm his old boss."
When Wang Xiangchao saw Hu Ruihui's hesitation, he became furious.
Logically speaking, it would be more convenient for him to find Lin Nan, but he felt a little embarrassed.
“Is the influence of this system so great?”
Hu Ruihui is a chip design engineer and naturally has some knowledge of EUV lithography technology, but only on the surface.
For example, if a person has eaten cake, he knows what ingredients it is made of, but he doesn’t know the production steps and details.
"The research and development process of domestic lithography machines has been shortened by at least ten years!"
Wang Xiangchao gave his evaluation in a firm tone.
Hu Ruihui knew very well that Wang Xiangchao was a serious person and would never speak without thinking. He took a deep breath and finally realized the abnormality of Xingyuan Technology.
The news was reported layer by layer, and a detailed investigation document was quickly delivered to Li Qingsong's desk.
"Secretarial control will be implemented. We will also transfer some of the scientific researchers in the fields of optics, dual worktables, and leveling and focusing to Xingyuan Technology."
The seminar was held in the morning and the resolution took effect on the same day.
The temptation of domestic EUV lithography machines is too great!
As long as you participate in it, you can gain a contribution that will be recorded in history. No one wants to miss this opportunity.
After Li Qingsong's resolution was issued, scientific research resources across the country began to converge on Xingyuan Technology.
Three days later, 87 experts from associations such as the Shanghai Institute of Optics and Precision Mechanics, the Shenyang Institute of Automation of the China Science and Technology Association, and the National University of Defense Technology arrived in Luzhou one after another.
There are industry leaders like Wang Xiangchao who have been deeply engaged in the EUV field for decades, as well as young backbones who have made their mark in the research and development of dual worktables and leveling and focusing systems.
Even the 65-nanometer process dual worktable technology mastered by Huazhuo Precision Technology was sent to Shanghai.
(End of this chapter)
Continue read on readnovelmtl.com
